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FACTORY INTEGRATION SOLUTIONS LLC

Translating Technology into Manufacturing

PVD Silicon Coating Services

Deposition Capabilities:

We can coat ion implanter disk shields, graphite beam shields, wafers up to 450 mm in diameter, and many other objects, including those with irregular heights. For more information, click here.

FIS Silicon Film Characteristics:

• Thickness, Uniformity and Appearance: Uniform nominal thickness 10% greater than specified with no visible defects, up to 30 microns. For uniformity data, click here.

• Contamination by SIMS Analysis: Less than 5 PPM each for Fe, Ni, Cu, Cr, Mo, Zn, and less than 25 PPM Al on a Sample Coupon. For contamination data, click here.

• Adhesion: Survive standard Scotch tape test.

• Density: >99% as measured by micro cross-section.

• Step Coverage: Click here

For one client's report on our Silicon film, click here.

FIS Silicon on GSD Shields